Co-sputtering相关论文
Effects of in-situ remote plasma treatment on amorphous indium gallium zinc oxide thin film transist
Amorphous InGaZnO (a-IGZO) material is a post transition metal oxide which has recently garnered much attention as a act......
Copper (Cu) ion releasing properties can influence the biocompatibility of these Cu-containing biomedical material and d......
Reactive Pulse Magnetron Co-sputtering of Transparent Conductive Ta or Nb Doped TiO2 Thin Films with
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In the vacuum coating field,the co-sputtering method by tow or more targets has been widely used for coating the composi......
For optoelectronic applications such as display drive transistors or photovoltaic cells,controlling the microstructure o......
为研制真空紫外与极紫外波段Al基薄膜光学元件,详细研究了Al基薄膜的应力特性及其优化方法。利用应力实时测量装置对共溅射技术制......
该文从挂篮荷载计算、施工流程、支座及临时固结施工、挂篮安装及试验、合拢段施工、模板制作安装、钢筋安装、混凝土的浇筑及养生......
用共溅射方法和固态源硒化方法,分别合成了Cu-In合金膜和CuIn(CIS)多晶薄膜,并用XRD,SEM和霍尔效应测量技术,分别测量了两种薄膜的......
本文报道了多靶直流磁控共溅射系统的设计及性能，三个直流磁控溅射枪呈１２０°空间角分布于真空罩上，并聚焦于基板中心，靶的有效直径为......
铝含量为５０％的Ｔａ／Ａｌ复合薄膜由于其具有优良的热稳定性而适用于制造高精密、高稳定功率型电阻或功率集成电阻网络。用钽铝复合靶直流共溅射......
采用共溅射和多层膜溅射两种不同的溅射方式制备FePt:Ag颗粒膜.MFM和TEM微观结构观测的结果表明:与多层膜溅射制备的FePt:Ag颗粒膜......
采用磁控共溅射方法制备了非晶态的SmCo磁性薄膜，用振动样品磁强计（VSM）分析了薄膜的磁学性能，并通过原位后退火处理研究了其磁学性能......
采用共溅射法结合后硒化成功制备出CZTSSe薄膜,主要研究了不同的硒化温度对CZTSSe薄膜与电池性能的影响。分别采用X射线衍射仪、拉......
The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge,Sb, and Te t......
该文报道了所研制的具有AIN/TbFeCo/AIN/AI四层结构磁光光盘的动态性能测试结果.当记录信息位尺寸为1μm时,信息读出载噪比大于45d......
以Ar为工作气体,O2为反应气体,利用射频磁控溅射技术成功地在载玻片上沉积了透明TiO2催化剂薄膜.同时利用共溅射技术制备了掺杂CeO......
利用双离子束溅射沉积共溅射方法制备了富Si-SiO2薄膜,研究了沉积参数、时间、工作气压PAr.基片温度等对沉积速率的影响,用TEM和XR......
采用射频磁控共溅射法,以In2O3和Zn2TiO4陶瓷靶为共溅射靶材,在玻璃衬底上制备了InTiZnO薄膜。在薄膜制备过程中,固定In2O3靶材的......
In this paper, we report on the first observation of blue-light emission bands from europium-doped tantalum pentoxide (T......
摘要：采用Cu、In双靶，直流磁控溅射的方法制备Cu-In薄膜，然后采用固态源硒化的方法形成CuInSe2（CIS）薄膜。采用SEM和EDX观察和分析了样......
目前所应用的SERS检测技术中,绝大部分都是贵金属材料,虽然贵金属材料都具有很强的拉曼增强效果,但是对激发光源却有很强的依赖,具......
采用射频磁控共溅射的方法制备出ZnO∶Al薄膜,以NO和O2为源气体（O2/O2＋NO=75%）、等离子体浸没离子注入（PIII）方法在不同的工艺条件下得......
采用磁控溅射共溅法，在铜箔和泡沫铜基底上分别制备了平面和三维网状结构的Sn-Al／Cu复合薄膜．表征了其结构，并研究了其作为锂离子电池......
Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Ma
TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering.......
Observation of Violet-Light Emission Band for Thulium-Doped Tantalum-Oxide Films Produced by Co-Sput
We prepared thulium-doped tantalum (V) oxide (Ta2O5:Tm) thin films using co-sputtering of two Tm2O3 pellets and a Ta2O5 ......
Preparation of Light-Emitting Ytterbium-Doped Tantalum-Oxide Thin Films Using a Simple Co-Sputtering
Light-emitting ytterbium-doped tantalum-oxide thin films were prepared using a simple co-sputtering method for the first......
Fabrication of Erbium and Ytterbium Co-Doped Tantalum-Oxide Thin Films Using Radio-Frequency Co-Sput
An erbium and ytterbium co-doped tantalum-oxide (Ta2 O5:Er, Yb) thin film was fabricated using a simple co-sputtering me......
Photoluminescence Properties of Thulium and Cerium Co-Doped Tantalum-Oxide Films Prepared by Radio-F
We prepared thulium and cerium co-doped tantalum-oxide (Ta2O5 :Tm, Ce) thin films by radiofrequency co-sputtering of Tm2......
本文采用磁控共溅射法在玻璃衬底上制备了Cr：ZnO薄膜,利用XRD、XPS、PPMS测试手段对制备的样品进行表征,结果表明：Cr以Cr3＋离子形式掺......
Photoluminescence Properties of Europium and Cerium Co-Doped Tantalum-Oxide Thin Films Prepared Usin
We fabricated europium and cerium co-doped tantalum (V) oxide (Ta2O5: Eu, Ce) thin films using our co-sputtering method ......
We prepared CuO-Ta2O5 composite films using our simple co-sputtering method for the first time. Four specimens were prep......
Photoluminescence and X-Ray Diffraction Properties of Europium and Silver Co-Doped Tantalum-Oxide Th
We fabricated europium and silver co-doped tantalum-oxide (Ta2O5:Eu, Ag) thin films using a simple co-sputtering method ......
